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2025年原子层沉积技术原理及在航天领域的应用现状.pdf

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英雄者,胸怀大志,腹有良策,有包藏宇宙之机,吞吐天地之志者也。——《三国演义》
原子层沉积技术原理及在航天领域的应用现状

Atomic layer deposition (ALD) is a thin film deposition technique that
is based on the sequential use of gas-phase chemical processes. 原子
层沉积(ALD)是一种薄膜沉积技术,它基于气相化学过程的顺序使用。
ALD involves the use of two or more precursor gases that react with
the substrate surface in a sequential and self-limiting manner to
achieve atomic scale control over thin film growth. ALD 涉及使用两种
或两种以上的前体气体,这些气体以顺序和自限制的方式与基底表面发生反
应,以实现对薄膜生长的原子尺度控制。 This technique is widely used
in various industries, including space technology. 这种技术在各个行业
广泛应用,包括航天技术。

In the field of aerospace, ALD has found applications in the
development of advanced materials for spacecraft and satellite
components. 在航天领域,ALD已经在航天器和卫星部件的先进材料开发
中找到了应用。The ability of ALD to precisely control the thickness
and composition of thin films makes it ideal for creating protective
coatings and functional layers for space applications. ALD 精确控制薄
膜厚度和组成的能力使其成为航天应用中创建保护涂层和功能层的理想选择。
For example, ALD can be used to deposit corrosion-resistant : .
太上有立德,其次有立功,其次有立言,虽久不废,此谓不朽。——《左传》
coatings on the surface of spacecraft to protect them from the harsh
space environment. 例如,ALD 可以用来在航天器表面沉积耐腐蚀的涂层,
以保护它们免受严酷的空间环境的影响。

Moreover, ALD is also employed in the fabrication of electronic
components for space missions. 此外,ALD还被用于航天任务中电子元
件的制造。The precise control over film thickness and uniformity
offered by ALD is crucial in ensuring the reliability and performance
of electronic devices operating in space. ALD 提供的薄膜厚度和均匀性
的精确控制对于确保在空间中运行的电子设备的可靠性和性能至关重要。By
using ALD, manufacturers can create thin film transistors, capacitors,
and other electronic components that are resistant to radiation and
temperature extremes encountered in space. 通过使用 ALD,制造商可
以制造出对空间中遇到的辐射和极端温度具有抗性的薄膜晶体管、电容器和
其他电子元件。

Furthermore, ALD plays a role in the development of thermal control
coatings for space vehicles. 此外,ALD在开发航天器的热控涂层方面发
挥作用。These coatings are designed to manage the temperature of
spacecraft and satellite surfaces, preventing overheating or excessive
cooling during different phases of a mission. 这些涂层旨在管理航天器 : .
古之立大事者,不惟有超世之才,亦必有坚忍不拔之志。——苏轼
和卫星表面的温度,在任务的不同阶段防止过热或过度冷却。ALD allows
for the precise deposition of thermal control coatings with tailored
properties, such as high solar reflectance and infrared emissivity, to
effectively manage the thermal conditions of space vehicles. ALD 允
许精确沉积具有定制特性的热控涂层,如高太阳反射率和红外辐射率,以有
效管理航天器的热条件。

In addition to its applications in spacecraft and satellite technologies,
ALD is also utilized in the production of optics and sensors for space
exploration. 除了在航天器和卫星技术中的应用之外,ALD 还用于光学和传
感器的生产,用于空间探索。The ability of ALD to create precise and
uniform thin films makes it suitable for coating optical surfaces and
fabricating sensor components with high accuracy. ALD 创造精确和均
匀的薄膜的能力使其适用于涂覆光学表面和制造具有高精度的传感器元件。
This enables the development of high-performance lenses, mirrors,
and sensors that are essential for space-based observation and
exploration missions. 这使得可以开发出对于基于空间的观测和探索任务
至关重要的高性能透镜、镜子和传感器。

Overall, the principles of atomic layer deposition and its applications
in the aerospace industry demonstrate the significant role of this : .
吾日三省乎吾身。为人谋而不忠乎?与朋友交而不信乎?传不习乎? ——《论语》
technology in advancing space exploration and technology. 总的来说,
原子层沉积的原理及其在航空航天工业中的应用展示了这一技术在推动空间
探索和技术方面的重要作用。ALD's ability to precisely control thin film
growth and tailor material properties makes it indispensable for the
development of advanced spacecraft and satellite components that
can withstand the extreme conditions of space. ALD 精确控制薄膜的生
长并调整材料特性的能力使其不可或缺,以便开发能够经受住在空间中的极
端条件的先进航天器和卫星部件。As space exploration continues to
advance, ALD is likely to play an increasingly vital role in enabling the
next generation of space technologies and missions. 随着空间探索的
不断推进,ALD可能在促进下一代空间技术和任务方面发挥越来越重要的作
用。