文档介绍：Research on Vacuum Plasma Processing for Optical Surface
Discipline:Optical Engineering Student Signature: 西%伊丫
Supervisor Signature: 山协W广俨才吼。蹦~
Abstract
Compared with traditional polishing methods,the plasma polishing technology has advantage of processing effect,and has been widely applied in the field of microelectronics and optical to the current specific practical problems in the optical
element,vacuum plasma technology is applied to the manufacturing ofUltra-smooth Can rapidly remove the cutter mark of the formation in C grinding process and remove effectively the surface defects and sub-surface damage of the optical material,and reduce the optical losses of optical element by the plasma active radicals and ions of the chemical reaction.
Based on the existing polishing experiment facility,capacitive coupled plasma source of RF discharge method Was plasma source could realize
probe was applied to diagnose plasma influence of processing parameters
(RF power,working pressure,the gas flow rate of the Argon,the gas flow rate of the Oxygen and the gas flow rate of the CFO on surface roughness and etching rate were studied by the technology of capacitive coupled plasma and inductively coupled ,the chemical removal mechanism ofthe vacuum plasma on the surface ofquartz is preliminarily discussed.
The research suggests that the optimal parameters in the ICP-98A process experiment are RF power of 180w,Argon flow rate of 70seem,Oxygen flow rate of 10seem,CF4 flow rate of 30 seem and working pressure of 2Pa and etching time of one hour on quartz RF bias,surface roughness of quartz is improved and reduced to 9nm on these , maximum etching rate of 1 has been pared wiⅡl the physical sputtering plasma etch rates is obviously profile accuracy of quartz surface is improved by to by plasma IBE-300