文档介绍:CONTRIBUTORS
Numbers in parentheses indicate the pages on which the authors’ contribution begin.
A. T. ANDREWS IV, Department of Chemical Engineering, Princeton University,
Princeton, NJ 08544, USA (65)
A. G. DIXON, Department of Chemical Engineering, Worcester Polytechnic
Institute, Worcester, MA 01609, USA (307)
L.-S. FAN, Department of Chemical and Biomolecular Engineering, The Ohio
State University, 140 West 19th Avenue, Columbus, OH 43210, USA (1)
R. O. Fox, Herbert L. Stiles Professor of Chemical Engineering, Iowa State
University, 3162 Sweeney Hall, Ames, IA 50011-2230, USA (231)
Currently on sabbatical at:
Swiss Federal Institute of Technology Zurich, ETHZ Institut fu¨r Chemie-
und Bioingenieurwissenschaften ETH-Ho¨nggerberg/HCI H 109 (Gruppe
Morbidelli), CH-8093 Zurich, Switzerland
Y. GE, Department of Chemical and Biomolecular Engineering, The Ohio State
University, 140 West 19th Avenue, Columbus, OH 43210, USA (1)
J. A. M. KUIPERS, University of Twente, Faculty of Science & Technology, PO
Box 217, NL - 7500 AE Enschede, herlands (65)
M. NIJEMEISLAND, Johnson Matthey Catalysts, Billingham, UK (307)
E. H. STITT, Johnson Matthey Catalysts, Billingham, UK (307)
S. SUNDARESAN, Department of Chemical Engineering, Princeton University,
Princeton, NJ 08544, USA (65)
H. E. A. VAN DEN AKKER, Delft University of Technology, Molenwindsingel 50,
NL 4105 HK , herlands (151)
M. A. VAN DER HOEF, Department of Science and Technology, University of
Twente, PO 217, NL - 7500 AE Enschede, herlands (65)
M. VAN SINT ANNALAND, Department of Science and Technology, University of
Twente, PO 217, NL - 7500 AE Enschede, herlands (65)
M. YE, Department of Science and Technology, University of Twente, PO 217,
NL - 7500 AE Enschede, herlands (65)
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PREFACE
This issue attempts to give a feeling of the state-of-the-art of the application
putational fluid dynamics (CFD) in chemical engineering. It is, however,
not limited to a snap-shot