文档介绍：————————————————————————————————————————————————————— FePt-SiO2 纳米颗粒薄膜的制备和表征 Material Sciences 材料科学, 2016, 6(1), 26-31 Published Online January 2016 in Hans. Fabrication and Characterization of FePt-SiO2 Nanogranular Films Haiqin Hu, Li Zhang*, Jinwan Han, Juncheng Jiang, Hui He College of Physics and Engineering, Taizhou University, Taizhou Zhejiang thththReceived: Dec. 29, 2015; accepted: Jan. 17, 2016; published: Jan. 20, 2016 Copyright ? 2016 by authors and Hans Publishers Inc. This work is licensed under the mons Attribution International License (CC BY). Abstract FePt-SiO2 nanogranular film was fabricated ona silicon substrate by ron sputtering me-thod. A MgO interlayer was applied to induce the L10 structure in the FePt thin film. The addition of silicon oxide helps reduce the grain size of FePt. XRD, SQUID and TEM were applied to measure its structure, ic properties, and microstructures, respectively. Results show that the film has excellent L10 order, and the squareness of MH loop is close to unity, with a high perpendicular coercivity of 21 kOe. The microstructure shows that it has small grain size ————————————————————————————————————————————————————— of nm with uniform distribution. This ic film isa promising candidate for ic recording media with ultra- high areal density. Keywords FePt Granular Film, ron Sputtering Method 胡海琴,章黎* ,韩锦婉,蒋俊程,何慧台州学院物理与电子工程学院,浙江台州收稿日