文档介绍：INDUSTRIAL APPLICATION OF PULSED DC
BIAS POWER SUPPLIES IN CLOSED FIELD
UNBALANCED RON SPUTTER ION
PLATING
K. E. Cooke, J. Hampshire, W. Southall and D. G. Teer
Pulsed dc power supplies are monly used in the preservation of critical surface characteristics, are also
reactive ron deposition of dielectric coatings discussed. SE/517
from conductive or partially conductive sputtering
targets. Their advantages, particularly the elimination
of arcing and enhanced process stability are well The authors are with Teer Coatings Limited, West
recognised. parison, the application of pulsed dc Stone House, Berry Hill Industrial Estate, Droitwich,
power to the biasing of substrates in ion plating Worcestershire WR9 9AS, UK (@
processes has received much less attention. The present ). Based on a presentation at the
study draws on experience with a range of pulsed dc meeting on ‘Pulsed plasma processing’ held at Salford
bias supplies in industrial coating equipment, exploiting University on 17 September 2003. Accepted 26
closed field unbalanced ron sputtering technol- February 2004.
ogy. Pulsed plasma characteristics have an impact on
all stages of the coating process, from initial surface Keywords: Pulsed dc bias power, Closed field
cleaning through to interface formation and the coating unbalanced ron sputter ion plating, Sputter
ponents, requiri