1 / 6
文档名称:

Electrochemical+behavior+of+dental+implant+system+before+andafter+clinical+use.pdf

格式:pdf   页数:6
下载后只包含 1 个 PDF 格式的文档,没有任何的图纸或源代码,查看文件列表

如果您已付费下载过本站文档,您可以点这里二次下载

Electrochemical+behavior+of+dental+implant+system+before+andafter+clinical+use.pdf

上传人:zhuhl0912 2014/4/2 文件大小:0 KB

下载得到文件列表

Electrochemical+behavior+of+dental+implant+system+before+andafter+clinical+use.pdf

文档介绍

文档介绍:万方数据
邋翦鬻哿ScienceDiThereforeinsolutionTheconditionsTheUniversity,Gwangju520825KoreaUniversity,Gwangju520825Koreaiiiiii-_____iioKIMlYongTae篸籩l產conducted[3].,士℃.—.CHUNGlHeeJungJEONGlMeeKyoung,,狢1DepartmentProsthodonticsCollege2DepartmentNanoInterface;畉at(36511Electrochemicalprocessis瓹膖substancemetalinresearchesFor,,瑃studyweimplant畉specimenthe166mN}sTheofldeaeratedone琣蕁from1;·籉:—;:,,TransNonferrousAbstractElectrochemicalfixtureTononusedworkingpotentiostatAftertestthe甌systemandpassivationindicating畐..—:
万方数据
usedThe;痜;of(3651025EG&。hina鎢,Bodephaseobtainedanddefects琣鹪瓵甌Tithenonclinicallyuse
万方数据
fixtureMechanicalFig2(a)Fig2(c)Figs2(a)(b)and(c)as土℃.;痜;—alTransNonferrous
万方数据
【.I'piIimplantswhichresistance(Rn)[89Alsoinspecimenthedensity(Acm2)士¨℃)showingDCandplot(Fig4Itone[6]demonstratingused[7due(Fig5)the。resistance(R)891士士℃ursbutsmall瑃lowThisinsideAlsostability4010Acm2stabilityIt..semicircleThe甌,,,.,,l2畉Fig5Firstas【areathe痩to-1111isareaGenerally,the.。℃—/(torsFrequencyHzuse
万方数据
materials甌,浚甌,pound一。瓵,implantit%皇士℃fraction)(b)After,..%.--poundgreatly,