文档介绍：硕士学位论文摘要摘要***化类金刚石薄膜(FDLC)是基于传统类金刚石膜的基础上发展起来的一种改性材料,该膜具有许多比金刚石薄膜更加良好的性能, 因此引起了人们的极大关注。深入研究掺***量以及工艺条件改变对 FDLc薄膜性能的影响有很重要的现实意义。本文采用等离子体增强化学气相沉积法在抛光的硅片和玻璃片上制备了***化类金刚石薄膜,反应气体选用CFl、CHt和Ar,并对制备的薄膜进行了退火处理。利用椭偏仪测量薄膜的厚度,用俄歇能谱、 FTIR光谱、Raman光谱分析薄膜成分含量及键结构,用接触角测量仪测量薄膜与液体的接触角,用四探针测量薄膜绝缘电阻、用紫外可见光测量薄膜透过率。本文研究了流量比、沉积温度、退火温度、沉积功率等工艺条件对FDLC薄膜疏水性能、电学性能、力学性能以及光学性能的影响。同时,利用模拟数据和实验实测数据对比分析工艺条件对FDLc/Ag/FDLC光学多层膜的电气指数的影响。研究结果表明: 。。流量比、沉积温度、退火温度、沉积功率的增加有效改善了薄膜的疏水性能和疏油性能。、表面硬度与工艺条件有很强的依赖关系,流量比、沉积温度以及沉积功率的增加,薄膜的绝缘电阻、表面硬度增大。;沉积温度以及沉积功率的增加使得薄膜可见光透过率减小。 ;软件模拟数据和实验实测数据有很大程度的一致性;本文所制备的FDLC/Ag/FDLC光学多层膜的电气指数远远大于现有透明导电膜的电气指数,具有很重要的应用参考价值。关键词***化类金刚石,射频等离子体增强化学气相沉积,疏水性能, 接触角,透过率硕士学位论文 ABSTRACT 啊1e FDLC is akind ofmodification material which based on traditional DLC,The function of the films betterthan DLC,which attractedmany people’S attention,therefore,it isnecessary that adeep research On theinfluence ofd删咖fluorinate amount and process conditionofFDLC filmproperties. Generally speaking,three gases(CFJCH,/Ar)are used toprepare FDLC film 011 polished silicon slicesand quartz slicesby PECVD methed,and theprepared fjllms are ,the thickness ofthe films before and afterannealing ismeasured byellipsometer,The A啦黟electron spectroscopy,FTIR and Raman analyzed the content of film,contactangle ofthefilmmeasuredby surfacetension me鼬ure apparatus,the insulation resistanceme弱ured by four-probe and the wansmittance ofthefilmsmeasured by UV-,prepared FDLC/Ag/FDLC pared andanalyzed tothe dataofFilmWmard. The sdudy shows aSfollows: electronspectroscopy(AES)(AES)study indicated thatthe filmWaS thetypical DLC strucRnfe. conditions have great effect Oil the film’S hydrophobic nature. Witll ofdischarge ratio,depositiontemperature,annea- lingtemperature anddepositionpower,the film'shydrophobic nature and oil-repellent functionWaSmodified. theinc