文档介绍：
第3卷第4期
2008年4月
中国科技论文在线SCIENCEPAPER ONLINE
ITO薄膜的微结构及其分形表征
孙兆奇-呂建国S蔡琪】，曹春斌I江锡顺I宋学萍】
(，合肥230039； ，合肥230061)
摘 要：采用直流磁控溅射法制备氧化钮锡(ITO), TEM和分形理论测试和分析了不同退火时 间ITO薄膜的微结构• XRD分析表明:退火时间持续增加， Sn"取代Sn"导致晶格常数减小和压应力不断释放导致晶格常数增大共同作用的结果。分形研究表明：分形维 。
关键词：$分形$氧化钢锡(ITO)薄膜
中图分类号：0484 文献标识码：A 文章编号：1673 - 7180(2008)04 - 0273 -5
Microstructure and fractal characterization of ITO films
SUN Zhaoqi1, LU Jianguo2, CAI Qi\ CAO Chunbin\ JIANG Xishud, SONG Xueping1
(1. School of Physics and Material Science, Anhui University. Hefei 230039 ；
2. Department of Physics and Electronic Engineering, Hefei Teachers College, Hefei 230061)
Abstract: Indium Tin Oxide (ITO) films, deposited by DC magnetron sputtering, were annealed at 300€ for different time. Microstructure and morphology of the ITO films are characterized by XRD, TEM and fractal. As the annealing time increasing, the effect of Sn4* replaceing Sn2+ combined with releasing compression stress induces the lattice constant decrease at first, and increase later. The fractal dimension decreases at first and increased later, revealing that the mean grain size varies with the same way as fractal dimension・
Key words: inorganic non-metallic meterial ； mic