文档介绍：2 2
2 2
2 2
1 2
2
2 2 2
2
2
2 2
常英等氢化锆表面 Cr C O氢渗透阻挡层 XPS分析
2
氢化锆表面 Cr C O氢渗透阻挡层 XPS分析
常英,赵平
(西华大学,四川成都 610039)
[摘要] 在空间堆中,氢化锆作为慢化剂的工作温度为 650~750℃,在此温度范围内, H /Zr原子数之比大于 1. 8
的氢化锆中的氢很容易析出。通过 X射线光电子能谱(XPS)研究了电镀法制备的氢化锆表面氢渗透阻挡层的化学态,对
镀层进行了深度(100、200、300nm)刻蚀分析和镀层原子的定量分析。结果表明,镀层中含有 C、O、Cr和 Zr,进行氢渗透试
验后(700℃保温)的试样镀层的 C—H键数量有明显增加,而 O—H键的数量变化不大。由此可以说明,氢渗透受阻的原
因是氢在渗透过程中被镀层中的 C优先捕获生成 C—H键。
[关键词] 氢化锆;电镀;氢渗透;阻挡层
[中图分类号] TG174. 4; TG156 8 [文献标识码]B [文章编号]1001 - 3660 (2006) 02 - 0060 - 02
Ana lysis of Cr C O Hydrogen Perm ea tion Barr ier on the Surface of the
Z ircon ium Hydr ide by XPS
CHAN G Ying, ZHAO P ing
(Xihua University, Chengdu 610039, China)
[ Abstract] Zirconium hydride ( atom ratio of H /Zr > 1. 8) as moderator which works at temperature be
tween 650℃ and 750℃ in space p iles, in this case, loses its hydrogen easily. Surface bonding state and certain
dep ths(100nm, 200nm , 300nm) in hydrogen permeation barriers of zirconium hydride p repared by p lating meth
od are investigated by XPS, and atom s of the film are analyzed quantitatively. The results show that it exists C,
O, Cr, Zr in the film. By analyzing the contents of the C H and O H bonding indicates that contents of C H
bonding which are p rocessing hydrogen permeation experiment(700℃ thermal retardation) increase remarkably,
O H bonding changes little. A conclus