文档介绍：Potentiostatic High Overpotential Studies of Copper Deposition
from Electroless Copper Solutions
Milan Paunovic*
en Corporation, PCK Technology Division, Melville, New York 11747
The mechanism of electroless metal deposition has !
been studied so far from two aspects: electrochemical and wA
structural. First, some mechanistic aspects of charge
transfer processes in electroless metal deposition were
studied by transient and quasi-steady-state electrochem-
ical techniques (1-6); second, the mechanistic aspects of
lattice formation processes were studied by scanning and
transmission electron microscopy (7-9). One unsolved
problem is a correlation between the electrochemical and
structural ic parameters.
The purpose of this study is to initiate work on the elu-
cidation of the above unsolved correlation problem. For
these studies, we have chosen the potentiostatic transient
method (10-13).
In munication, we report potentiostatic
current-time transients obtained in the studies of the ca-
thodic partial reaction in electroless copper deposition
using palladium and platinum electrodes. Results ob-
tained using a copper electrode were reported previously
(13). These measurements are the first applications of the
potentiostatic current-time technique to the study of pro-
ce