硅烷流量对电弧离子镀TiSiN 涂层结构和性能的影响.doc

文档介绍：
硅烷流量对电弧离子镀 TiSiN 涂层结构和
性能的影响#
杨兵1,田灿鑫2,洪梦庆2,万强1,王如意1,刘辉东1,陈燕鸣1,阎少健2,任峰
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(1. 武汉大学动力与机械学院,武汉 430072;
2. 武汉大学物理科学与技术学院加速器实验室,武汉 430072)
摘要:在硅烷气氛中采用电弧离子镀技术制备 TiSiN 复合涂层。系统研究了硅烷流量对涂层
结构和性能的影响。采用透射电子显微镜分析涂层结构,采用 X 射线光电子能谱分析涂层
化学键合状态,采用显微硬度计和摩擦磨损仪对涂层硬度和摩擦学性能进行评价。结果表明
随硅烷流量增加,TiSiN 涂层结构从柱状晶变为纳米晶。当硅烷流量为 m 时,涂层硬
度达到 4100HV,随后随硅烷流量增加而降低。当对磨材料为氮化硅时,涂层摩擦系数在
- 之间变化。硅烷流量对涂层具有非常显著的影响。
关键词:材料学;TiSiN 涂层;微结构;力学性能;摩擦学性能
中图分类号:TB332
The effects of SiH4 flowrate on the microstructure and
properties of TiSiN posite coatings by vacuum
cathodic arc ion plating
Yang Bing1, Tian Canxin2, Hong Mengqing2, Wan Qiang1, Wang Ruyi1, Liu
Huidong1, Chen Yanming1, Yan Shaojian2, Ren Feng2
(1. School of power and Mechanical Engineering,Wuhan University,Wuhan,China 430072;
2. Accelerator Laboratory, Department of Physics, Wuhan University, 430072 Wuhan, China)
Abstract: TiSiN posite hard coatings have been deposited onto silicon and cemented
carbide substrates by a vacuum cathodic arc ion plating system using high purity Ti target under
SiH4 ambient. The effects of SiH4 flowrate on the microstructure, mechanical and tribological
properties of the coatings were investigated systemically. Transmission electron microscopy and
X-ray diffraction techniques were employed to probe the microstructure. X-ray photoelectron
spectroscopy was used to investiga