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CMOS
LOCOSIsolation
siliconsubstrate
p-well
n-well
DepositResist
UVExposure
DevelopResist
FieldImplantB
RemoveResist
GrowFieldOxide
Fox
RemoveNitride
RemoveOxide
siliconsubstrate
p-well
n-well
GrowScreenOxide
CMOS
TransistorFabrication
VtImplant
DepositResist
UVExposure
DevelopResist
PunchthroughImplant
RemoveResist
RemoveOxide
Fox
siliconsubstrate
p-well
n-well
GrowGateOxide
CMOS
TransistorFabrication
DepositPolySi
PolySiImplant
polySi
polySi
DepositResist
UVExposure
DevelopResist
EtchPolySi
RemoveResist
Fox
siliconsubstrate
p-well
n-well
CMOS
TransistorFabrication
DepositThinOxide
DepositResist
UVExposure
DevelopResist
n-LDDImplant
RemoveResist
Fox
polySi
polySi
siliconsubstrate
p-well
n-well
CMOS
TransistorFabrication
DepositResist
UVExposure
DevelopResist
p-LDDImplant
RemoveResist
DepositSpacerOxide
EtchSpacerOxide
Fox
polySi
polySi
siliconsubstrate
p-well
n-well
CMOS
TransistorFabrication
DepositResist
UVExposure
DevelopResist
n+S/DImplant
n+
n+
RemoveResist
Fox
polySi
polySi
siliconsubstrate
p-well
n-well
CMOS
TransistorFabrication
DepositResist
UVExposure
DevelopResist
p+S/DImplant
p+
p+
RemoveResist
Fox
polySi
polySi
n+
n+
siliconsubstrate
p-well
n-well
CMOS
Contacts&Interconnects
DepositBPTEOS
BPTEOS
BPSGReflow
PlanarizationEtchback
DepositResist
UVExposure
DevelopResist
ContactEtchback
RemoveResist
Fox
polySi
polySi
n+
n+
p+
p+
siliconsubstrate
p-well
n-well
CMOS
Contacts&Interconnects
DepostMetal1
Metal1
DepositResist
UVExposure
DevelopResist
EtchMetal1
RemoveResist
Fox
polySi
polySi
p+
p+
n+
n+
BPTEOS